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Results 1 to 25 of 1791

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Improvement in electrical characteristics of Hf02 gate dielectrics treated by remote NH3 plasmaHUANG, Li-Tien; CHANG, Ming-Lun; HUANG, Jhih-Jie et al.Applied surface science. 2013, Vol 266, pp 89-93, issn 0169-4332, 5 p.Article

Preparation and luminescence of Lu4Hf3O12 powder samples doped by trivalent Eu, Tb, Ce, Pr, Bi ionsHAVLAK, Lubomir; BOHACEK, Pavel; NIKL, Martin et al.Optical materials (Amsterdam). 2010, Vol 32, Num 10, pp 1372-1374, issn 0925-3467, 3 p.Conference Paper

FT IR spectroscopy of silicon oxide and HfSiOx layer formationKOPANI, M; MIKULA, M; PINCIK, E et al.Applied surface science. 2014, Vol 312, pp 117-119, issn 0169-4332, 3 p.Article

FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layerKOPANI, M; MIKULA, M; PINCIK, E et al.Applied surface science. 2014, Vol 301, pp 24-27, issn 0169-4332, 4 p.Conference Paper

Preparation of hafnium oxide thin film by electron beam evaporation of hafnium incorporating a post thermal processSU XING; NINGLIN ZHANG; ZHITANG SONG et al.Microelectronic engineering. 2003, Vol 66, Num 1-4, pp 451-456, issn 0167-9317, 6 p.Conference Paper

Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin filmsSZYMANSKA, Magdalena; GIERALTOWSKA, Sylwia; WACHNICKI, Lukasz et al.Applied surface science. 2014, Vol 301, pp 28-33, issn 0169-4332, 6 p.Conference Paper

Investigating phosphonate monolayer stability on ALD oxide surfacesBRANCH, Brittany; DUBEY, Manish; ANDERSON, Aaron S et al.Applied surface science. 2014, Vol 288, pp 98-108, issn 0169-4332, 11 p.Article

Passivation of copper―hafnium thin films using self-forming hafnium oxideFANG, J. S; CHEN, Y. T.Surface & coatings technology. 2013, Vol 231, pp 166-170, issn 0257-8972, 5 p.Conference Paper

UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectricSON, S. Y; JANG, J. H; KUMAR, P et al.Applied surface science. 2008, Vol 254, Num 21, pp 7087-7091, issn 0169-4332, 5 p.Article

Optical properties of a-HfO2 thin filmsKHOSHMAN, Jebreel M; KORDESCH, Martin E.Surface & coatings technology. 2006, Vol 201, Num 6, pp 3530-3535, issn 0257-8972, 6 p.Article

Effects of the HfO2 sinterization temperature on the erbium luminescenceORDONEZ-ROMERO, César L; FLORES J., C; HERNANDEZ A, J et al.Journal of luminescence. 2014, Vol 145, pp 713-716, issn 0022-2313, 4 p.Article

Nanometer-Scale HfOx RRAMZHIPING ZHANG; YI WU; WONG, H.-S. Philip et al.IEEE electron device letters. 2013, Vol 34, Num 8, pp 1005-1007, issn 0741-3106, 3 p.Article

Ab initio calculation of relative permittivity of La-doped HfO2ONG, T. M; XU, S.Physica. B, Condensed matter. 2014, Vol 454, pp 184-188, issn 0921-4526, 5 p.Article

Amorphous hafnium oxide thin films for antireflection optical coatingsKHOSHMAN, J. M; KHAN, A; KORDESCH, M. E et al.Surface & coatings technology. 2008, Vol 202, Num 11, pp 2500-2502, issn 0257-8972, 3 p.Conference Paper

Study of the surface modification with oleic acid of nanosized Hf02 synthesized by the polymerized complex derived sol-gel methodRAMOS-GONZALEZ, R; GARCIA-CERDA, L. A; QUEVEDO-LOPEZ, M. A et al.Applied surface science. 2012, Vol 258, Num 16, pp 6034-6039, issn 0169-4332, 6 p.Article

Modeling of Retention Failure Behavior in Bipolar Oxide-Based Resistive Switching MemoryBIN GAO; HAOWEI ZHANG; KWONG, Dim-Lee et al.IEEE electron device letters. 2011, Vol 32, Num 3, pp 276-278, issn 0741-3106, 3 p.Article

Thermal stability of Hf02 nanotube arraysXIAOFENG QIU; HOWE, Jane Y; MEYER, Harry M et al.Applied surface science. 2011, Vol 257, Num 9, pp 4075-4081, issn 0169-4332, 7 p.Article

Dosimetry aspects of hafnium oxide metal-oxide-semiconductor (MOS) capacitorSENTHIL SRINIVASAN, V. S; PANDYA, Arun.Thin solid films. 2011, Vol 520, Num 1, pp 574-577, issn 0040-6090, 4 p.Article

High resolution photoemission study of the thermal stability of the HfO2/SiOx/Si(111) systemMCDONNELL, S; BRENNAN, B; CASEY, P et al.Surface science. 2011, Vol 605, Num 23-24, pp 1925-1928, issn 0039-6028, 4 p.Article

Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin filmsMILANOV, A; BHAKTA, R; THOMAS, R et al.Journal of material chemistry. 2006, Vol 16, Num 5, pp 437-440, issn 0959-9428, 4 p.Article

HYDROTHERMAL REACTION - SINTERING OF MONOCLINIC HFO2TORAYA H; YOSHIMURA M; SOMIYA S et al.1982; J. AM. CERAM. SOC.; ISSN 0002-7820; USA; DA. 1982; VOL. 65; NO 9; PP. C159-C160; BIBL. 11 REF.Article

Hafnia nanoparticles ― a model system for graphene growth on a dielectricKIDAMBI, Piran R; BAYER, Bernhard C; WEATHERUP, Robert S et al.Physica status solidi. Rapid research letters (Print). 2011, Vol 5, Num 9, pp 341-343, issn 1862-6254, 3 p.Article

Long time transients in hafnium oxidePUZZILLI, G; IRRERA, F.Microelectronic engineering. 2007, Vol 84, Num 9-10, pp 2394-2397, issn 0167-9317, 4 p.Conference Paper

Atomic layer deposition of HfO2 thin films using H2O2 as oxidantCHOI, Min-Jung; PARK, Hyung-Ho; DOO SEOK JEONG et al.Applied surface science. 2014, Vol 301, pp 451-455, issn 0169-4332, 5 p.Article

A Simplified Model for Resistive Switching of Oxide-Based Resistive Random Access Memory DevicesYANG LU; BIN GAO; YIHAN FU et al.IEEE electron device letters. 2012, Vol 33, Num 3, pp 306-308, issn 0741-3106, 3 p.Article

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